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Talk:Photomask

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Old talk

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The keyword "reticle" redirects here, but there's no mention on the page of gunsights...

-L. Greenway, Macon, GA

"Reticle" means more than gunsights.

Atlant 17:45, 15 November 2005 (UTC)[reply]

It means more than photomasking, too- they're an astronomical isntrument, as well. -FZ 20:08, 23 March 2006 (UTC)[reply]

Actually, it is redirected from "reticule" not "reticle", which actually does redirect to "crosshairs". Which brings me to my question, what is the proper spelling of "reticule/reticle"? 149.169.50.84 20:17, 6 March 2007 (UTC) akagie[reply]

--"Reticle" is the target, "Reticule" is a drawstring pouch style purse. Reticule SHOULD NOT re-direct here. They are NOT two different spellings of the same thing, they are two entirely different things that, if you are mispronouncing one of them, SOUND the same.--

The article states that the "correct" term is "reticle" or "photoreticle" - why, then, does the redirect go from reticule -> photomask, and not the other way around? If anything, the entry for reticle should include information on the masks used for integrated circuit photolithography, while the entry for photomask refers to 1:1 lithographic techniques. 192.52.57.34 (talk) 12:18, 19 August 2008 (UTC)[reply]

Toppan Photomasks, Inc. is part of Topan Printing Company. See http://www.toppan.co.jp/english/corporateinfo/bases/ Then click on the map "Overseas", then "North America". You will see Toppan Photomasks at the bottom of the list of their North American operations.

So in the list of leading commercial photomask manufacturers, should Toppan have two listings, or just one? —Preceding unsigned comment added by 68.28.138.231 (talk) 00:45, 26 February 2010 (UTC)[reply]

I have updated the Manufacturers section to be current, rather than giving 7 year old information, and cited a reference to back up what I have done. Companies are welcome to change their hyperlinks to what ever one they think is most appropriate to them. There may be a case of a "history of photomask manufacters" section giving details of company formations and mergers, but someone else can write this! —Preceding unsigned comment added by Jgordonhughes (talk • contribs) 11:14, 29 April 2010

I have removed the hyperlinks, they don't belong in the body of the article (WP:ELPOINTS). Fountains of Bryn Mawr (talk) 02:33, 29 February 2012 (UTC)[reply]

If "the more correct term is usually photoreticle" how come that is not the articles title? Needs rewording somewhere. Fountains of Bryn Mawr (talk) 20:41, 22 February 2012 (UTC)[reply]

The article focuses mainly on high-Tech photomasks. In research labs there is neither the money nor the need to produce with that high accuracy. If prototypes with high accuracy are needed, e-beam lithography (EBL) is used to write dirrectly onto waver fragments. The photo-masks are used often to produce rough pattern with e.g. a few micro meter accuracy to make connections with bonding pads for example. These masks can be bought for reasonable prices of a few hundred Dollars from small companies and they can also be produced using a cheap facilities: SEM with EBL, Resist Spinner, metal evaporator, hot plate and a few chemicals: Take a piece of the special-glass, evaporate Chromium on it, put it on the resist spinner and spin PMMA (dissolved in MIBK) onto it, put it a few minutes on the hotplate, write the pattern with EBL, develop in MIBK, etch with KOH and remove spare PMMA with Acetone. Rinse with IPA and your mask is ready for use. In general the article so far focuses on masks with projection after the mask and not contact masks (as I described it just in shortly)and it is unclear which of the things described in the article are about projection masks and which parts are applicable to contact masks as well... --Do ut des (talk) 15:48, 3 March 2013 (UTC)[reply]

Advanced repros is a small shop in the US NE, not appropriate to the section header. Shin-Etsu is a mask blank and mask resist maker, but, they do not manufacture photomasks, just the raw materials used to manufacture them. — Preceding unsigned comment added by 240D:1A:3B6:9600:B1F2:24D9:BE53:17AF (talk) 11:03, 18 January 2020 (UTC)[reply]