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Names | |
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IUPAC name
Hafnium disulfide | |
Identifiers | |
3D model (JSmol) |
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ChemSpider |
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ECHA InfoCard | 100.038.738 ![]() |
PubChem CID |
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CompTox Dashboard (EPA) |
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Properties | |
HfS2 | |
Molar mass | 246.62 g/mol[1] |
Appearance | Brown solid |
Density | 6.03 g/cm3[1] |
Band gap | ~1.8 eV (indirect)[2] |
Structure | |
hP3, P3m1, No 164[3] | |
a = 0.363 nm, c = 0.584 nm | |
Formula units (Z) |
1 |
Related compounds | |
Other anions |
Hafnium dioxide |
Other cations |
Tungsten disulfide Molybdenum disulfide |
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa). |
Hafnium disulfide is an inorganic compoundofhafnium and sulfur. It is a layered dichalcogenide with the chemical formula is HfS2. A few atomic layers of this material can be exfoliated using the standard Scotch Tape technique (see graphene) and used for the fabrication of a field-effect transistor.[4] High-yield synthesis of HfS2 has also been demonstrated using liquid phase exfoliation, resulting in the production of stable few-layer HfS2 flakes.[5] Hafnium disulfide powder can be produced by reacting hydrogen sulfide and hafnium oxides at 500–1300 °C.[6]
Sulfides (S2−)
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