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(Top) 1 Synthesis 2 Properties 3 Applications 4 References

Hafnium nitrate

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Hafnium nitrate
Names

Other names Hafnium tetranitrate
Identifiers
CAS Number	15509-05-4
3D model (JSmol)	Interactive image
ChemSpider	146363
EC Number	239-536-7
PubChem CID	167292
CompTox Dashboard (EPA)	DTXSID30890759
InChI InChI=1S/Hf.4NO3/c;42-1(3)4/q+4;4-1 Key: TZNXTUDMYCRCAP-UHFFFAOYSA-N
SMILES [N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[Hf+4]
Properties
Chemical formula	Hf(NO₃)₄
Molar mass	426.53 g/mol
Appearance	White crystals
Solubility in water	moderately soluble^[1]
Hazards
GHS labelling:
Pictograms
Signal word	Danger
Hazard statements	H272, H315, H319, H335
Precautionary statements	P210, P220, P221, P305, P338, P405, P501
Related compounds
Related compounds	Thorium nitrate, Zirconium nitrate, titanium nitrate
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa). Infobox references

Hafnium(IV) nitrate is an inorganic compound, a salt of hafnium and nitric acid with the chemical formula Hf(NO₃)₄.^[2]^[3]^[4]

Synthesis[edit]

Hafnium nitrate can be prepared by the reaction of hafnium tetrachloride and dinitrogen pentoxide.^[5]

Properties[edit]

Hafnium nitrate is slightly volatile, and can be sublimed at 110 °C and 0.1 mmHg.^[6] Hafnium nitrate decomposes on heating (≥ 160°C) to HfO(NO₃)₂ and then to HfO₂.^[6]

Applications[edit]

Hafnium nitrate can be used for the preparation of materials containing hafnium dioxide.^[6]

References[edit]

^ "Hafnium Nitrate (CAS: 15509-05-4) | Stanford Advanced Materials". samaterials.com. Retrieved 29 October 2021.

^ "Hafnium(IV) nitrate". Sigma Aldrich. Retrieved 29 October 2021.

^ "Hafnium Nitrate". American Elements. Retrieved 29 October 2021.

^ The Metallurgy of Hafnium. Naval Reactors, Division of Reactor Development, U.S. Atomic Energy Commission. 1960. p. 31. Retrieved 29 October 2021.

^ Zhuang, Weiwei; Conley, John F.; Ono, Yoshi; Evans, David R.; Solanki, R. (January 2002). "Hafnium Nitrate Precursor Synthesis and HfO₂ Thin Film Deposition". Integrated Ferroelectrics. 48 (1): 3–12. Bibcode:2002InFer..48....3Z. doi:10.1080/10584580215449. S2CID 50290009.

^ ^a ^b ^c Conley, J. F.; Ono, Y.; Zhuang, W.; Tweet, D. J.; Gao, W.; Mohammed, S. K.; Solanki, R. (2002). "Atomic Layer Deposition of Hafnium Oxide Using Anhydrous Hafnium Nitrate". Electrochemical and Solid-State Letters. 5 (5): C57. doi:10.1149/1.1462875. ISSN 1099-0062. Retrieved 29 October 2021.